DocumentCode :
242217
Title :
Impact of gate coupling and misalignment on performance of double-gate organic thin film transistors
Author :
Jing-Wen Han ; Lei Sun ; Hao Xu ; Yi-Bo Zhang ; Sheng-Dong Zhang ; Yi Wang
Author_Institution :
Inst. of Microelectron., Peking Univ., Shenzhen, China
fYear :
2014
fDate :
28-31 Oct. 2014
Firstpage :
1
Lastpage :
3
Abstract :
This paper presents a numerical simulation of the electrically separable dual-gate organic thin film transistors (DG-OTFTs). It is revealed that double-gate architecture is able to dynamically control the threshold voltage by the coupling of the top/bottom gates, and the threshold voltage was insensitive to the thickness of the active layer. The contact resistance of staggered OTFTs is decreased with thinner organic semiconductor layer thickness. We also observe that the device characteristics are sensitive to the misalignment, and the significant change of the driving ability and threshold voltage is also observed while misalignment exists.
Keywords :
contact resistance; coupled circuits; numerical analysis; organic semiconductors; thin film transistors; voltage control; active layer; contact resistance; device characteristics; double-gate organic thin film transistors performance; electrically separable DG-OTFT; misalignment impact; numerical simulation; staggered OTFT; thinner organic semiconductor layer thickness; threshold voltage control; top-bottom gate coupling; Abstracts; Integrated circuits; Logic gates; Materials; Performance evaluation; Transistors;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State and Integrated Circuit Technology (ICSICT), 2014 12th IEEE International Conference on
Conference_Location :
Guilin
Print_ISBN :
978-1-4799-3296-2
Type :
conf
DOI :
10.1109/ICSICT.2014.7021535
Filename :
7021535
Link To Document :
بازگشت