Photolithographic laboratory instruction at Rochester Institute of Technology

Author

Smith, B.W. ; Hesler, K.H. ; Fuller, L.F. ; Chomicz, T.

Author_Institution

Dept. of Microelectron. Eng., Rochester Inst. of Technol., NY, USA

fYear

1989

fDate

12-14 Jun 1989

Firstpage

123

Lastpage

127

Abstract

Describes the topics covered by Microlithography I and II laboratories and the Advanced Microelectronic Chemistry Laboratory at the Rochester Institute of Technology. Involvement in Microlithography I lab introduces the students to photoresist application and measurement experiments, radiometric characteristics of photolithographic systems. optical exposure and overlay methods, linewidth measurement, and image evaluation using a scanning electron microscope. Microlithography II lab introduces the students to some advanced state-of-the-art lithography techniques being used in IC fabrication at the micrometer and submicrometer levels. Advanced Microlithography introduces the students to the characteristics of image formation and image recording and their matching for optimum performance

Keywords

education; integrated circuit manufacture; photolithography; Advanced Microelectronic Chemistry Laboratory; Microlithography; Rochester Institute of Technology; image evaluation; image formation; image recording; linewidth measurement; micrometer; optical exposure; overlay; photolithographic systems; photoresist application; radiometric characteristics; scanning electron microscope; submicrometer; Chemical technology; Chemistry; Electron optics; Laboratories; Lithography; Microelectronics; Optical microscopy; Radiometry; Resists; Scanning electron microscopy;

fLanguage

English

Publisher

ieee

Conference_Titel

University/Government/Industry Microelectronics Symposium, 1989. Proceedings., Eighth

Conference_Location

Westborough, MA

ISSN

0749-6877

Type

conf

DOI

10.1109/UGIM.1989.37318

Filename

37318