Title :
Photolithographic laboratory instruction at Rochester Institute of Technology
Author :
Smith, B.W. ; Hesler, K.H. ; Fuller, L.F. ; Chomicz, T.
Author_Institution :
Dept. of Microelectron. Eng., Rochester Inst. of Technol., NY, USA
Abstract :
Describes the topics covered by Microlithography I and II laboratories and the Advanced Microelectronic Chemistry Laboratory at the Rochester Institute of Technology. Involvement in Microlithography I lab introduces the students to photoresist application and measurement experiments, radiometric characteristics of photolithographic systems. optical exposure and overlay methods, linewidth measurement, and image evaluation using a scanning electron microscope. Microlithography II lab introduces the students to some advanced state-of-the-art lithography techniques being used in IC fabrication at the micrometer and submicrometer levels. Advanced Microlithography introduces the students to the characteristics of image formation and image recording and their matching for optimum performance
Keywords :
education; integrated circuit manufacture; photolithography; Advanced Microelectronic Chemistry Laboratory; Microlithography; Rochester Institute of Technology; image evaluation; image formation; image recording; linewidth measurement; micrometer; optical exposure; overlay; photolithographic systems; photoresist application; radiometric characteristics; scanning electron microscope; submicrometer; Chemical technology; Chemistry; Electron optics; Laboratories; Lithography; Microelectronics; Optical microscopy; Radiometry; Resists; Scanning electron microscopy;
Conference_Titel :
University/Government/Industry Microelectronics Symposium, 1989. Proceedings., Eighth
Conference_Location :
Westborough, MA
DOI :
10.1109/UGIM.1989.37318
