Title :
A VLSI design course for process engineers
Author :
Pearson, Robert E. ; Fuller, Lynn F.
Author_Institution :
Dept. of Microelectron. Eng., Rochester Inst. of Technol., NY, USA
Abstract :
The authors describe the background of student process engineers in microelectronic engineering and compare the basic VLSI design course requirements of these students with those in computer engineering. An outline of the course is then provided. The benefit of having both a fabrication facility and a sophisticated design environment as examples is shown to be important in an overview course. The computer engineering department serves as the role model for a sophisticated VLSI design group. Well-rounded process engineers capable of discussing design aspects of an integrated circuit problem are the desired result of this course
Keywords :
VLSI; circuit CAD; educational courses; VLSI design course; course requirements; design environment; fabrication facility; microelectronic engineering; process engineers; role model; student; Circuit testing; Design engineering; Engineering students; Integrated circuit synthesis; Integrated circuit technology; Logic design; Microelectronics; Process design; Resists; Very large scale integration;
Conference_Titel :
University/Government/Industry Microelectronics Symposium, 1989. Proceedings., Eighth
Conference_Location :
Westborough, MA
DOI :
10.1109/UGIM.1989.37319