Title :
Advanced semicustom design and fabrication at the Institute for Microelectronics Stuttgart
Author :
Beunder, M. ; Chen, G. ; Kernhof, J. ; Schau, M. ; Haas, W. ; Springer, R. ; Schwederski, T. ; Hoefflinger, B.
Author_Institution :
Inst. for Microelectron., Stuttgart, West Germany
Abstract :
The authors describe the development of the CMOS GATE FOREST design and fabrication environment. They discuss the advantages of a semicustom solution, the advanced design tools that are being developed, the fabrication process including the application of an electron beam direct write-on-wafer machine, and the subsequent test process. To highlight the capabilities and the use of the GATE FOREST, two industrial research projects and two student (master thesis) projects are discussed. The industrial projects have a complexity of more than 120 K active transistors and present state-of-the-art VLSI/ULSI design applications. The student projects, which cover a period of six to eight months, include the design, fabrication, and test of sample circuits
Keywords :
CMOS integrated circuits; VLSI; application specific integrated circuits; cellular arrays; circuit CAD; integrated circuit technology; integrated circuit testing; logic arrays; logic testing; ASIC; CAD; CMOS GATE FOREST; Institute for Microelectronics Stuttgart; ULSI; VLSI; computer aided design; electron beam direct write-on-wafer machine; fabrication process; semicustom design; test process; Circuit testing; Education; Educational institutions; Electron beams; Fabrication; Microelectronics; Spine; Transistors; Ultra large scale integration; Very large scale integration;
Conference_Titel :
University/Government/Industry Microelectronics Symposium, 1989. Proceedings., Eighth
Conference_Location :
Westborough, MA
DOI :
10.1109/UGIM.1989.37340