Title :
A process design model and an application
Author :
Kalyanaram, Gurumurthy
Author_Institution :
Texas Univ., Dallas, TX, USA
Abstract :
Summary form only given. There are two methodologies, conjoint analysis and the Taguchi design model, that provide the tools for product and process design. Here, the author briefly describes the application of the Taguchi model to the capillary drawing process in a semiconductor firm. A well designed capillary drawing process is shown to be critical to managing the yield in semiconductor manufacture
Keywords :
capillarity; circuit optimisation; design engineering; drawing (mechanical); integrated circuit yield; management; manufacturing processes; semiconductor device manufacture; Taguchi design model; capillary drawing process; process design model; semiconductor manufacturing firm; yield management; Calibration; Costs; Fractionation; Manufacturing processes; Process control; Process design; Product design; Product development; Signal to noise ratio; Testing;
Conference_Titel :
Innovation in Technology Management - The Key to Global Leadership. PICMET '97: Portland International Conference on Management and Technology
Conference_Location :
Portland, OR
Print_ISBN :
0-7803-3574-0
DOI :
10.1109/PICMET.1997.653735
