DocumentCode :
2425249
Title :
Nano-patterned AlGaInP light-emitting diode based on UV-Kiss metal transfer technology
Author :
Hsieh, Yi-Ta ; Chen, Chun-Hung ; Lee, Yung-Chun ; Zeng, Xu-Feng ; Shei, Shih-Chang ; Lin, Hung-Yi
Author_Institution :
Dept. of Mech. Eng., Nat. Cheng Kung Univ., Tainan, Taiwan
fYear :
2010
fDate :
20-23 Jan. 2010
Firstpage :
915
Lastpage :
918
Abstract :
This paper describes a new nano-patterning technique, the UV-Kiss Metal Transfer (UV-KMT) method, and applies it for patterning micro/nano-structures on AlGaInP light-emitting diodes (LEDs) for enhancing their light extraction efficiency. First of all, an ETFE mold with micro/nano-features is replicated from a silicon master mold. A thin metal film is then deposited on the ETFE mold which has very low surface energy. A layer of UV curable polymer solution is spin-coated on an AlGaInP LED surface. The metal-film coated EFTE mold and the UV-polymer coated LED are brought into contact with a uniformly distributed pressure of 0.1 MPa, and UV light is radiated through the ETFE mold and solidifies the UV polymer. The solidified UV polymer has stronger adhesion to the metal film in contact with, and therefore can transfer the metal pattern defined by the convex surface feature of the ETFE mold onto the AlGaInP LED surface. The transferred metal pattern is then serving as an etching mask for RIE etching on the underlying UV polymer layer. Finally, a patterned structure consisting of a metal film on top and an underlying UV polymer layer is formed on the LED surface. This metal/polymer surface structure can well serve as an etching mask again for ICP etching on the LED, and hence complete the fabrication of micro/nano-structures on the top surfaces of AlGaInP LEDs for enhancing their light extraction efficiency. The optical power measurement using an integrating sphere shows that the extraction efficiency of the patterned LED is 25% higher than that of the conventional LED. In short, we demonstrate an easily implemented, cost effective, and powerful method to pattern LED substrate.
Keywords :
III-V semiconductors; adhesion; aluminium compounds; curing; gallium compounds; indium compounds; light emitting diodes; masks; metallic thin films; moulding; nanopatterning; polymer solutions; spin coating; sputter etching; surface energy; surface structure; ultraviolet radiation effects; AlGaInP; ETFE mold; ICP etching; RIE etching; UV curable polymer solution; UV-kiss metal transfer technology; UV-polymer coating; adhesion; convex surface feature; etching mask; light extraction efficiency; metal pattern; metal-film coated mold; metal-polymer surface structure; microstructure patterning; nanopatterned light-emitting diode; nanostructure patterning; optical power measurement; pressure 0.1 MPa; silicon master mold; solidification; spin coating; surface energy; thin metal film deposition; Contact Transfer Lithography; Extraction Quantum Efficiency; Light-emitting diodes (LEDs);
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Nano/Micro Engineered and Molecular Systems (NEMS), 2010 5th IEEE International Conference on
Conference_Location :
Xiamen
Print_ISBN :
978-1-4244-6543-9
Type :
conf
DOI :
10.1109/NEMS.2010.5592117
Filename :
5592117
Link To Document :
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