DocumentCode :
2425558
Title :
Thermal-uniformity-aware X-filling to reduce temperature-induced delay variation for accurate at-speed testing
Author :
Yoneda, Tomokazu ; Inoue, Michiko ; Sato, Yasuo ; Fujiwara, Hideo
Author_Institution :
Nara Inst. of Sci. & Technol., Kansai Science City, Japan
fYear :
2010
fDate :
19-22 April 2010
Firstpage :
188
Lastpage :
193
Abstract :
It is well known that the test mode exceeds the functional mode in power consumption, which is not uniformly distributed within the circuit. The non-uniformity in spatial power distribution may cause localized heating and temperature differences within the circuit. Since gate delay depends on junction temperature, thermal differences within the circuit may lead to erroneous pass or fail in at-speed testing. This paper first discusses the importance of spatial thermal uniformity for high quality and accurate at-speed testing. The paper also presents an X-filling technique that minimizes the spatial temperature variation within the circuit while preserving the overall circuit power consumption at low level. Experimental results show the effectiveness of the proposed method compared to the existing X-filling techniques.
Keywords :
VLSI; heating; integrated circuit testing; VLSI test; at-speed testing accuracy; circuit power consumption; gate delay; junction temperature; localized heating; spatial power distribution; spatial temperature variation; spatial thermal uniformity; temperature-induced variation; thermal-uniformity-aware X-filling; Delay; Testing; Very large scale integration; X-filling; at-speed test; test power; thermal-uniformity;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
VLSI Test Symposium (VTS), 2010 28th
Conference_Location :
Santa Cruz, CA
ISSN :
1093-0167
Print_ISBN :
978-1-4244-6649-8
Type :
conf
DOI :
10.1109/VTS.2010.5469578
Filename :
5469578
Link To Document :
بازگشت