DocumentCode :
2426256
Title :
Excess hot-carrier currents in SOI MOSFETs and its implications
Author :
Su, Pin ; Goto, Ken-Ichi ; Sugii, Toshihiro ; Hu, Chenming
Author_Institution :
Dept. of Electr. Eng. & Comput. Sci., California Univ., Berkeley, CA, USA
fYear :
2002
fDate :
2002
Firstpage :
93
Lastpage :
97
Abstract :
This work demonstrates that excess hot-carrier currents in SOI MOSFETs are caused by self-heating. Self-heating-free ISUB data should be used for dynamic lifetime extrapolation due to long thermal time constant. The underlying mechanism, increased impact ionization with temperature at low drain bias, is studied experimentally from the angle of thermal activation energy. Our study indicates that the driving force of impact ionization transitions from the electric field to the lattice temperature with power-supply scaling below 1.2 V.
Keywords :
MOSFET; hot carriers; impact ionisation; low-power electronics; semiconductor device reliability; silicon-on-insulator; thermal resistance; 1.2 V; SOI MOSFETs; Si; drain bias; dynamic lifetime extrapolation; excess hot-carrier currents; impact ionization; lattice temperature; power-supply scaling; self-heating; thermal activation energy; thermal time constant; CMOS technology; Hot carriers; Impact ionization; Laboratories; MOSFETs; Silicon; Substrates; Temperature dependence; Thermal conductivity; Thermal resistance;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Reliability Physics Symposium Proceedings, 2002. 40th Annual
Print_ISBN :
0-7803-7352-9
Type :
conf
DOI :
10.1109/RELPHY.2002.996615
Filename :
996615
Link To Document :
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