• DocumentCode
    2426466
  • Title

    Effects of non-ideal fabrication on the dilution performance of serially functioned microfluidic concentration gradient generator

  • Author

    Wang, Shiying ; Ji, Ning ; Wang, Wei ; Li, Zhihong

  • Author_Institution
    Sch. of Phys., Peking Univ., Beijing, China
  • fYear
    2010
  • fDate
    20-23 Jan. 2010
  • Firstpage
    169
  • Lastpage
    172
  • Abstract
    Presently, serial dilution microfluidic chip attracts tremendous interests due to the important applications in generating logarithmic concentration gradients in chemical and biochemical experiments. In this work, effects of fabrication errors on the dilution performance were numerically studied and several guiding principles for the device design were presented. Based on the microfluidic resistance network, channel dimension and flow rate were found to be two important factors in obtaining a stable and precise logarithmic gradient generator. Considering the fabrication errors in the DRIE process of fabricating microchannels on a wafer, placement of chips was optimized to minimize the geometrical error effects on the dilution performance.
  • Keywords
    microfluidics; sputter etching; DRIE process; channel dimension; flow rate; geometrical error effect; logarithmic concentration gradient; logarithmic gradient generator; microchannel; microfluidic concentration gradient generator; microfluidic resistance network; serial dilution microfluidic chip; Concentration gradient generator Dilution ratio error Fabrication error Microfluidic;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nano/Micro Engineered and Molecular Systems (NEMS), 2010 5th IEEE International Conference on
  • Conference_Location
    Xiamen
  • Print_ISBN
    978-1-4244-6543-9
  • Type

    conf

  • DOI
    10.1109/NEMS.2010.5592175
  • Filename
    5592175