DocumentCode
2426466
Title
Effects of non-ideal fabrication on the dilution performance of serially functioned microfluidic concentration gradient generator
Author
Wang, Shiying ; Ji, Ning ; Wang, Wei ; Li, Zhihong
Author_Institution
Sch. of Phys., Peking Univ., Beijing, China
fYear
2010
fDate
20-23 Jan. 2010
Firstpage
169
Lastpage
172
Abstract
Presently, serial dilution microfluidic chip attracts tremendous interests due to the important applications in generating logarithmic concentration gradients in chemical and biochemical experiments. In this work, effects of fabrication errors on the dilution performance were numerically studied and several guiding principles for the device design were presented. Based on the microfluidic resistance network, channel dimension and flow rate were found to be two important factors in obtaining a stable and precise logarithmic gradient generator. Considering the fabrication errors in the DRIE process of fabricating microchannels on a wafer, placement of chips was optimized to minimize the geometrical error effects on the dilution performance.
Keywords
microfluidics; sputter etching; DRIE process; channel dimension; flow rate; geometrical error effect; logarithmic concentration gradient; logarithmic gradient generator; microchannel; microfluidic concentration gradient generator; microfluidic resistance network; serial dilution microfluidic chip; Concentration gradient generator Dilution ratio error Fabrication error Microfluidic;
fLanguage
English
Publisher
ieee
Conference_Titel
Nano/Micro Engineered and Molecular Systems (NEMS), 2010 5th IEEE International Conference on
Conference_Location
Xiamen
Print_ISBN
978-1-4244-6543-9
Type
conf
DOI
10.1109/NEMS.2010.5592175
Filename
5592175
Link To Document