DocumentCode
2426513
Title
ESD circuit simulation for the prevention of ESD failures - application to products in a 0.18 μm CMOS technology
Author
Wolf, Heinrich ; Gieser, Horst
Author_Institution
Fraunhofer-Inst. Zuverlassigkeit und Mikrointegration, Munich, Germany
fYear
2002
fDate
2002
Firstpage
162
Lastpage
169
Abstract
This paper describes the ESD circuit simulation of MOS transistors processed in a 0.18 μm CMOS technology. The extended model simulates the breakdown between the external base and the emitter diffusion as well as the forward bias condition. The applied parameter extraction methodology also comprises device simulation. Including the transient behavior the model is verified by means of test circuits. Moreover, this approach simulates "real world" failures of product circuits.
Keywords
CMOS integrated circuits; MOSFET; circuit simulation; electric breakdown; electrostatic discharge; failure analysis; integrated circuit modelling; 0.18 micron; CMOS technology; ESD circuit simulation; ESD failure; MOS transistor; electric breakdown; parameter extraction; CMOS process; CMOS technology; Circuit simulation; Circuit testing; Coupling circuits; Electric breakdown; Electrostatic discharge; MOSFETs; Parameter extraction; Semiconductor device modeling;
fLanguage
English
Publisher
ieee
Conference_Titel
Reliability Physics Symposium Proceedings, 2002. 40th Annual
Print_ISBN
0-7803-7352-9
Type
conf
DOI
10.1109/RELPHY.2002.996630
Filename
996630
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