Point based rendering algorithm for simulation of photoresist development

The simulation of the photoresist development is one of key step for lithographical simulation which is necessary to integrated circuit fabrication. Traditionally, the simulation results are presented by vertices and polygons which donpsilat adequately support displaying complex scene of point-cloud data. To cope with these problems, we use a hierarchical point-based representation algorithm for rendering. In order to full the gaps during the advance of the surface, we introduce a pre-interpolation algorithm. Meanwhile, we introduce a physical model for photoresist development based on the Dillpsilas algorithm, Kim Model and ray algorithm. The experimental results demonstrate that the development model, the pre-interpolation algorithm and the hierarchical point-based rendering algorithm are effective for development simulation with 3D large-scale visualization in real-time.