DocumentCode
2427049
Title
Fabrication of microlens array based on multiple plane waves interference
Author
Li, Gaoming ; Liu, Shou ; Liu, Gouhua ; Qiu, Yishen ; Chen, Xiaoyun
Author_Institution
Sch. of Phys. & Mech. & Electr. Eng., Xiamen Univ., Xiamen, China
fYear
2010
fDate
20-23 Jan. 2010
Firstpage
259
Lastpage
261
Abstract
A fabrication process of microlens array using multiple plane waves interference is described. Maskless exposure system is superposed on a photoresist coated substrate layer. Multiple plane waves interference is provided by the refractions of gratings. The period of microlens array range from 1um to 10um and the diameter of single microlen can be produced less than the period. Furthermore large area of micro arrays can be realized with low cost.
Keywords
holography; microlenses; photoresists; maskless exposure system; microlens array; multiple plane waves interference; photoresist coated substrate layer; Holographic optical components; Interference; Microlenses;
fLanguage
English
Publisher
ieee
Conference_Titel
Nano/Micro Engineered and Molecular Systems (NEMS), 2010 5th IEEE International Conference on
Conference_Location
Xiamen
Print_ISBN
978-1-4244-6543-9
Type
conf
DOI
10.1109/NEMS.2010.5592208
Filename
5592208
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