Title :
Application of CW-CRDS to monitor and control chemical vapor deposition
Author :
Green, D.S. ; Looney, J.P. ; Rubloff, G.W.
Abstract :
Continuous wave excitation cavity ring-down spectroscopy (CW-CRDS) is being developed for real time chemical sensing of volatile CVD byproducts (e.g. HF, H/sub 2/O) and as a quantitative and robust metrology tool for advanced process control methodologies.
Keywords :
chemical vapour deposition; gas sensors; infrared spectroscopy; optical sensors; process control; process monitoring; spectrochemical analysis; CVD control; CVD monitoring; CW excitation cavity ring-down spectroscopy; advanced process control methodologies; benchtop sensing platform; quantitative metrology; real time chemical sensing; volatile CVD byproducts; wafer state metrology; Absorption; Chemical vapor deposition; Hafnium; Metrology; Mirrors; Monitoring; Process control; Semiconductor device manufacture; Semiconductor films; Spectroscopy;
Conference_Titel :
Electronic-Enhanced Optics, Optical Sensing in Semiconductor Manufacturing, Electro-Optics in Space, Broadband Optical Networks, 2000. Digest of the LEOS Summer Topical Meetings
Conference_Location :
Aventura, FL, USA
Print_ISBN :
0-7803-6252-7
DOI :
10.1109/LEOSST.2000.869712
