Title :
Hierarchical Nested Surface Channels for Reduced Particle Stacking and Low-Resistance Thermal Interfaces
Author :
Linderman, R.J. ; Brunschwiler, T. ; Kloter, U. ; Toy, H. ; Michel, B.
Author_Institution :
Zurich Res. Lab., IBM Res. GmbH, Ruschlikon
Abstract :
This paper reports on the improvement of thermal interfaces through the control of particle stacking during bondline formation. Particle stacking occurs in highly filled materials due to pressure gradients developing during squeeze flow over a rectangular surface, resulting in non-uniform interface properties and thick bondlines with a large thermal resistance. Nested surface channel designs are presented to create a uniform pressure drop as interface material flows across a rectangular surface. Reductions in thermal resistance of 2-3times compared with that of flat surfaces are demonstrated with similar reductions in bondline thickness and assembly pressure. We obtained thermal resistances as low as 2 Kmm2/W for thin bondlines (< 5 mum). Comparative power-cycling results also demonstrate improved reliability against paste pump-out with nested channel interfaces.
Keywords :
thermal management (packaging); thermal resistance; bondline formation; hierarchical nested surface channels; interface material; lid attach; low-resistance thermal interfaces; reduced particle stacking; squeeze flow; thermal resistance; Assembly; Bonding; Conducting materials; Stacking; Surface resistance; Thermal conductivity; Thermal loading; Thermal resistance; Thermal stresses; Viscosity; TIM; Thermal interface material; bondline; filtering; lid attach; nested channels; particle stacking; squeeze flow;
Conference_Titel :
Semiconductor Thermal Measurement and Management Symposium, 2007. SEMI-THERM 2007. Twenty Third Annual IEEE
Conference_Location :
San Jose, CA
Print_ISBN :
1-4244-09589-4
Electronic_ISBN :
1065-2221
DOI :
10.1109/STHERM.2007.352392