• DocumentCode
    2429026
  • Title

    4-kV 100-Mbps monolithic isolator on SOI with multi-trench isolation for wideband network

  • Author

    Hashimoto, T. ; Yuyama, Y. ; Amishiro, M. ; Nemoto, M. ; Yukutake, S. ; Kojima, Y. ; Kanekawa, N. ; Takeuchi, Y. ; Watanebe, A.

  • Author_Institution
    Hitachi Res. Lab., Hitachi Ltd., Hitachi, Japan
  • fYear
    2009
  • fDate
    14-18 June 2009
  • Firstpage
    49
  • Lastpage
    52
  • Abstract
    We have developed a monolithic isolator that provides an isolation voltage of 4 kV and a signal transmission rate of 100 Mbps. Two circuit areas are isolated using 34 trenches on a bonded SOI with 3-mum-thick buried oxide. The inequality in the voltages applied to the trenches is reduced using polysilicon resistors parallel to the trenches, which increases the isolation voltage from 2.4 to 4.0 kV. The isolator consists of two series of high-voltage capacitors in which silicon on buried oxide and a third metal are used as electrodes. We have also developed a network interface LSI with 4-channel isolators, which provide 4-kV isolation and 100-Mbps transmission.
  • Keywords
    broadband networks; isolation technology; silicon-on-insulator; monolithic isolator; multiple trench isolation; polysilicon resistors; silicon on insulator; voltage 2.4 kV to 4 kV; wideband network; Bonding; Capacitors; Circuits; Electrodes; Isolators; Network interfaces; Resistors; Silicon; Voltage; Wideband;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Power Semiconductor Devices & IC's, 2009. ISPSD 2009. 21st International Symposium on
  • Conference_Location
    Barcelona
  • ISSN
    1943-653X
  • Print_ISBN
    978-1-4244-3525-8
  • Electronic_ISBN
    1943-653X
  • Type

    conf

  • DOI
    10.1109/ISPSD.2009.5157998
  • Filename
    5157998