• DocumentCode
    2429451
  • Title

    Influence of glow cathode on parameters of ion-beam plasma

  • Author

    Dudin, S.V. ; Zykov, A.V. ; Farenik, V.I.

  • Author_Institution
    Sci. Center of Phys. Technol., Kharkov State Univ., Ukraine
  • fYear
    1995
  • fDate
    5-8 June 1995
  • Firstpage
    286
  • Abstract
    Summary form only given. The results of an experimental investigation of ion-beam plasma parameters in an ion etching technological system are presented for the case of ion beam space charge neutralization by a glow cathode-neutralizer (CN) in comparison with analogous results without CN. The measured parameters were plasma potential /spl phi//sub pl/, neutralizing electrons energy distribution f/sub e/ and temperature of its maxwellian kernel T/sub e/. The investigation was performed on the vacuum unit equipped with the multichannel Hall-type ion source "Radical-M" (production of "Vacuummashpribor", Moscow). The beam radius and length was 50 mm and 200 mm respectively, average beam energy was 0.3-1 keV, beam current varied over the range of 1-50 mA. The beam propagated in a vacuum chamber with grounded metal walls at gas pressure in the range of 10/sup -5/-10/sup -3/ Torr. CN was a tungsten wire of 0.4 mm diameter. To measure /spl phi//sub pl/, T/sub e/, f/sub e/ a Langmuir probe was used with addition of modulation technique of probe current double differentiation.
  • Keywords
    Langmuir probes; glow discharges; ion beams; plasma diagnostics; plasma temperature; plasma-beam interactions; sputter etching; temperature; 0.3 to 1 keV; 1 to 50 mA; 1E-5 to 1E-3 torr; Langmuir probe; W wire; glow cathode; glow cathode-neutralizer; ion beam space charge neutralization; ion etching technological system; ion-beam plasma; maxwellian kernel; multichannel Hall-type ion source Radical-M; neutralizing electrons energy distribution; plasma potential; temperature; vacuum unit; Cathodes; Current measurement; Etching; Ion beams; Plasma applications; Plasma measurements; Plasma temperature; Probes; Space charge; Space technology;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 1995. IEEE Conference Record - Abstracts., 1995 IEEE International Conference on
  • Conference_Location
    Madison, WI, USA
  • ISSN
    0730-9244
  • Print_ISBN
    0-7803-2669-5
  • Type

    conf

  • DOI
    10.1109/PLASMA.1995.533536
  • Filename
    533536