DocumentCode :
2429473
Title :
TAC-IGBT: An improved IGBT structure
Author :
Li, Zehong ; Qian, Mengliang ; Zhang, Bo
Author_Institution :
State key Lab. of Electron. Thin Films & Integrated Devices, Univ. of Electron. Sci. & Technol. of China, Chengdu, China
fYear :
2009
fDate :
14-18 June 2009
Firstpage :
124
Lastpage :
127
Abstract :
An improved trench insulated gate bipolar transistors (TIGBT), called the trench accumulation layer controlled insulated gate bipolar transistor (TAC-IGBT) is proposed. In this new device, the P base of the conventional TIGBT (CT-IGBT) is completely removed, an accumulation channel is incorporated. Numerical simulation results indicate that the structure has lower on-state voltage drop, larger latching current density and smaller gate charge. At the condition of the collector current is 5.0 times 10-5 A/mum, the on-state voltage drop of the TAC-IGBT is 0.5 V lower than the CT-IGBT structure. The latching current density increases nearly one order of magnitude. The gate charge needed for the TAC-IGBT is less than 1/3 of the CT-IGBT structure. Furthermore, the TAC-IGBT is more simple and cheaper for fabrication.
Keywords :
current density; insulated gate bipolar transistors; isolation technology; IGBT structure; TAC-IGBT; accumulation channel; gate charge; latching current density; on-state voltage drop; trench accumulation layer controlled insulated gate bipolar transistor; trench insulated gate bipolar transistors; Capacitance; Current density; Electrons; Insulated gate bipolar transistors; Laboratories; MOSFET circuits; Power MOSFET; Temperature; Thin film devices; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Power Semiconductor Devices & IC's, 2009. ISPSD 2009. 21st International Symposium on
Conference_Location :
Barcelona
ISSN :
1943-653X
Print_ISBN :
978-1-4244-3525-8
Electronic_ISBN :
1943-653X
Type :
conf
DOI :
10.1109/ISPSD.2009.5158017
Filename :
5158017
Link To Document :
بازگشت