Intense electron beam generation by a pseudospark discharge and its application to a Raman FEL

Summary form only given, as follows. An electron beam with high power, high current density, and high voltage was generated by a pseudospark discharge. The electron beams have a voltage of 200 keV, a current of 2 kA, and a beam diameter of 1 mm. The beam penetrated to a 0.3 mm hole on a copper foil of 0.05 mm thick at the distance of 5 cm from the anode and to a 0.6 mm hole on an acid-sensitive film at the distance of 15 cm. The details of the experiments are presented. The construction of the discharge is described and the design of a Raman free-electron laser using the electron beam (producing a 5-10 mm radiation at 30% efficiency by using a wiggler with 1 cm period, 5-10 cm total length, and 0.5 T strength) is discussed.