• DocumentCode
    2430495
  • Title

    Design and process considerations for 1200V HVIC technology

  • Author

    Choi, Yongcheol ; Jeon, Changki ; Kim, Minsuk

  • Author_Institution
    Process Dev., Fairchild Korea Semicond., Pucheon, South Korea
  • fYear
    2009
  • fDate
    14-18 June 2009
  • Firstpage
    311
  • Lastpage
    314
  • Abstract
    A 1200 V LDMOS structure based on 600 V LDMOS technology has been developed for level shifters of industrial high side gate driver IC and SPMreg solution. For a 1200 V LDMOS, the two serious phenomena occurred such as walk-out of a few hundreds volts and burn-out at a few muA of drain current during breakdown measurement unlike 600 V LDMOS having rugged breakdown characteristics. In this work, these challenges were clearly solved by critical techniques and LDMOS showed stable breakdown voltage of about 1400 V without walk-out and burn-out phenomena. Here, the causes and prevention technics on these challenges are described in detail in this paper.
  • Keywords
    power integrated circuits; HVIC technology; LDMOS structure; LDMOS technology; breakdown measurement; process considerations; rugged breakdown characteristics; stable breakdown voltage; voltage 1200 V; voltage 1400 V; voltage 600 V; Breakdown voltage; Doping; Electric breakdown; Electric variables measurement; Implants; Low voltage; Process design; Silicon; Voltage control; Voltage measurement;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Power Semiconductor Devices & IC's, 2009. ISPSD 2009. 21st International Symposium on
  • Conference_Location
    Barcelona
  • ISSN
    1943-653X
  • Print_ISBN
    978-1-4244-3525-8
  • Electronic_ISBN
    1943-653X
  • Type

    conf

  • DOI
    10.1109/ISPSD.2009.5158064
  • Filename
    5158064