DocumentCode :
2431104
Title :
Development of a New Physics-Based RF Model for AlGaN/GaN HFETs
Author :
Yin, Hong ; Bilbro, G.L. ; Trew, R.J. ; Liu, Y. ; Kuang, W.
Author_Institution :
Dept. of ECE, North Carolina State Univ., Raleigh, NC
fYear :
2006
fDate :
4-5 Dec. 2006
Firstpage :
1
Lastpage :
4
Abstract :
A physics-based analytic model is built based on the discovery of a new zone in AlGaN/GaN HFETs that is observed in 2D device simulations, especially at high drain bias. The zone is located in the drain access region and is named the "charge deficit zone" after its particular property of a partially filled quantum well. This zone plays an important role when the HFET is under high drain bias because most of the drain voltage is dropped across it and a high lateral electric field exists within it. Good agreement is achieved in comparisons between the model and corresponding simulation results from the commercial ATLAS simulator.
Keywords :
aluminium compounds; circuit simulation; gallium compounds; high electron mobility transistors; semiconductor device models; wide band gap semiconductors; 2D device simulations; ATLAS simulator; AlGaN-GaN; HFET; RF model; heterostructure field effect transistors; Aluminum gallium nitride; Analytical models; Circuit simulation; Electrodes; Electrons; Gallium nitride; HEMTs; MODFETs; Radio frequency; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Wireless and Microwave Technology Conference, 2006. WAMICON '06. IEEE Annual
Conference_Location :
Clearwater Beach, FL
Print_ISBN :
1-4244-0849-0
Electronic_ISBN :
1-4244-0849-0
Type :
conf
DOI :
10.1109/WAMICON.2006.351913
Filename :
4161075
Link To Document :
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