Screen printed multicrystalline silicon solar cells with porous silicon antireflection coating

Author

Bilyalov, R.R. ; Groh, B. ; Lautensclager, H. ; Schindler, R. ; Schomann, F.

Author_Institution

Fraunhofer-Inst. fur Solare Energiesysteme, Freiburg, Germany

fYear

1997

fDate

29 Sep-3 Oct 1997

Firstpage

147

Lastpage

150

Abstract

The successful application of chemically etched porous silicon (PS) as an antireflection coating (ARC) for multicrystalline silicon (mc-Si) solar cell is reported. The evaluation of the Si surface after chemical etching by microscopical and optical characterization shows the great potential of PS in ARC application. For the first time the PS ARC was formed by simple chemical etching without any protection on the commercial mc-Si solar cells with screen printed contacts. The optimization of the etching parameters results in 12.3% efficiency of 10×10 cm² mc-Si solar cell with PS ARC

Keywords

antireflection coatings; electrical contacts; elemental semiconductors; etching; optimisation; silicon; solar cells; thick films; 12.3 percent; Si solar cells; chemical etching; microscopical characterization; multicrystalline solar cells; optical characterization; optimization; porous Si antireflection coating; screen printed contacts; Chemicals; Coatings; Etching; Metallization; Photovoltaic cells; Protection; Rough surfaces; Silicon; Surface morphology; Surface roughness;

fLanguage

English

Publisher

ieee

Conference_Titel

Photovoltaic Specialists Conference, 1997., Conference Record of the Twenty-Sixth IEEE

Conference_Location

Anaheim, CA

ISSN

0160-8371

Print_ISBN

0-7803-3767-0

Type

conf

DOI

10.1109/PVSC.1997.654050

Filename

654050