DocumentCode
2432052
Title
New types of negative ion sources
Author
Borisko, V.N. ; Lapshin, V.I.
Author_Institution
Kharkiv State Univ., Ukraine
fYear
1995
fDate
5-8 June 1995
Firstpage
132
Abstract
Summary form only given, as follows. The plasma sources of negative ions which were elaborated in Kharkov State University are considered in the paper. These sources use the mechanism of dissociative sticking of electrons with low energies to molecules of the working gas. The effective work of such sources needs the use of special systems of low energy electron formation. The effect of secondary electron emission as used in negative ion sources is considered. The electrode material with large coefficient of secondary electron emission allows one to obtain a few slow electrons per one bombarding electron. The plasma of a Penning discharge is an emitter of initial electrons. The electron electromagnetic trap in the secondary electron emission region allows one to enlarge the volume of interaction of low energy electrons with the working gas molecules. The lifetime of slow electrons grow in this trap.
Keywords
Penning discharges; Penning ion sources; ion sources; plasma collision processes; plasma production; secondary electron emission; Kharkov State University; Penning discharge; bombarding electron; dissociative sticking; effective work; electrode material; electron electromagnetic trap; electrons; initial electrons; low energy electron formation; low energy electrons; molecules; negative ion sources; negative ions; plasma sources; secondary electron emission; slow electrons; working gas; Cathodes; Electrodes; Electron beams; Electron emission; Fault location; Ion emission; Ion sources; Plasma accelerators; Plasma sources; Plasma stability;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science, 1995. IEEE Conference Record - Abstracts., 1995 IEEE International Conference on
Conference_Location
Madison, WI, USA
ISSN
0730-9244
Print_ISBN
0-7803-2669-5
Type
conf
DOI
10.1109/PLASMA.1995.533553
Filename
533553
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