• DocumentCode
    2432052
  • Title

    New types of negative ion sources

  • Author

    Borisko, V.N. ; Lapshin, V.I.

  • Author_Institution
    Kharkiv State Univ., Ukraine
  • fYear
    1995
  • fDate
    5-8 June 1995
  • Firstpage
    132
  • Abstract
    Summary form only given, as follows. The plasma sources of negative ions which were elaborated in Kharkov State University are considered in the paper. These sources use the mechanism of dissociative sticking of electrons with low energies to molecules of the working gas. The effective work of such sources needs the use of special systems of low energy electron formation. The effect of secondary electron emission as used in negative ion sources is considered. The electrode material with large coefficient of secondary electron emission allows one to obtain a few slow electrons per one bombarding electron. The plasma of a Penning discharge is an emitter of initial electrons. The electron electromagnetic trap in the secondary electron emission region allows one to enlarge the volume of interaction of low energy electrons with the working gas molecules. The lifetime of slow electrons grow in this trap.
  • Keywords
    Penning discharges; Penning ion sources; ion sources; plasma collision processes; plasma production; secondary electron emission; Kharkov State University; Penning discharge; bombarding electron; dissociative sticking; effective work; electrode material; electron electromagnetic trap; electrons; initial electrons; low energy electron formation; low energy electrons; molecules; negative ion sources; negative ions; plasma sources; secondary electron emission; slow electrons; working gas; Cathodes; Electrodes; Electron beams; Electron emission; Fault location; Ion emission; Ion sources; Plasma accelerators; Plasma sources; Plasma stability;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 1995. IEEE Conference Record - Abstracts., 1995 IEEE International Conference on
  • Conference_Location
    Madison, WI, USA
  • ISSN
    0730-9244
  • Print_ISBN
    0-7803-2669-5
  • Type

    conf

  • DOI
    10.1109/PLASMA.1995.533553
  • Filename
    533553