DocumentCode
2432277
Title
Near-field Scanning Optical Microscopy — Breaking the diffraction limit using nano light emitting probe tip
Author
Zhang, Xiaojing John ; Hoshino, Kazunori ; Vanden Bout, D.A.
Author_Institution
Dept. of Biomed. Eng., Univ. of Texas at Austin, Austin, TX
fYear
2008
fDate
21-23 July 2008
Firstpage
89
Lastpage
90
Abstract
We describe optical and topographic imaging using a light emitting diode (LED) monolithically integrated on a silicon probe tip for Near-field Scanning Optical Microscopy (NSOM). The light emission resulted from a silicon dioxide layer buried between a phosphorus-doped N+ silicon layer and a gallium-doped P+ silicon region created locally at the tip by a focused ion beam (FIB). The tip was employed in a standard NSOM excitation setup. The probe successfully measured optical as well as topographic images of a chromium test pattern with imaging resolutions of 400 nm and 50 nm, respectively. The directional resolution dependence of the acquired images directly corresponds to the shape, size and polarity of the light source on the probe tip. To our knowledge, this report is the first successful near-field imaging result directly measured by such tip-embedded light sources.
Keywords
bio-optics; focused ion beam technology; gallium; light emitting diodes; nanobiotechnology; optical microscopy; phosphorus; S:Ga; S:P; SiO2; diffraction limit; focused ion beam; light emitting diode; nanolight emitting probe tip; near field scanning optical microscopy; topographic images; Image resolution; Integrated optics; Light emitting diodes; Optical diffraction; Optical imaging; Optical microscopy; Particle beam optics; Probes; Silicon; Stimulated emission;
fLanguage
English
Publisher
ieee
Conference_Titel
IEEE/LEOS Summer Topical Meetings, 2008 Digest of the
Conference_Location
Acapulco
ISSN
1099-4742
Print_ISBN
978-1-4244-1925-8
Electronic_ISBN
1099-4742
Type
conf
DOI
10.1109/LEOSST.2008.4590503
Filename
4590503
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