• DocumentCode
    2433891
  • Title

    The nonliner in MEMS touch mode capacitive devices

  • Author

    Feng, Yongjian ; Wang, Shaojie

  • Author_Institution
    Dept. of Mech. & Electr. Eng., Xiamen Univ., Xiamen, China
  • fYear
    2010
  • fDate
    20-23 Jan. 2010
  • Firstpage
    1154
  • Lastpage
    1159
  • Abstract
    Capacitive touch MEMS devices have better performance and higher sensitivity than conventional capacitive MEMS device. Because the diaphragm of these capacitive MEMS device touches the substrate in the operation, it also can withstand large over distortion, thus it is very suitable for industrial applications. However, hysteresis has been observed on some devices, especially for high sensitivity devices, when the load is cycled. In fabrication experiments, it is found that the P+ diffused diaphragm is deformed after the Si-Si bonding and subsequent high temperature annealing. The fabricated P+ diaphragm of some Si-Si sensor buckles downward toward the substrate, with no applied distortion. From an analysis of fabrication processes and a finite element modeling study, it is suggested that the P+ diaphragm was deformed when no load is applied. When a positive load is applied, the diaphragm touches the substrate creating a “compression” stress in the touched section of the diaphragm and making this part of the diaphragm raised. The hysteresis observed is the result of this unstable diaphragm. This hypothesis can be used to calculate the size of hysteresis and explain some of the observed experimental results.
  • Keywords
    capacitive sensors; finite element analysis; hysteresis; micromechanical devices; MEMS touch mode capacitive devices; P+ diffused diaphragm; Si-Si bonding; compression stress; fabrication processes; finite element modeling; high temperature annealing; hysteresis; Diaphragm modeling; Hysteresis; Touch mode device; Unstable diaphragm;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nano/Micro Engineered and Molecular Systems (NEMS), 2010 5th IEEE International Conference on
  • Conference_Location
    Xiamen
  • Print_ISBN
    978-1-4244-6543-9
  • Type

    conf

  • DOI
    10.1109/NEMS.2010.5592535
  • Filename
    5592535