Title :
AlGaN/GaN Polarization-Doped Field-Effect Transistors With Graded Heterostructure
Author :
Yulong Fang ; Zhihong Feng ; Jiayun Yin ; Xingye Zhou ; Yuangang Wang ; Guodong Gu ; Xubo Song ; Yuanjie Lv ; Chengming Li ; Shujun Cai
Author_Institution :
Sch. of Mater. Sci. & Eng., Univ. of Sci. & Technol. Beijing, Beijing, China
Abstract :
The design, fabrication, and characterization of AlGaN/GaN polarization-doped field-effect transistors (PolFETs) with graded heterostructure are presented in this paper. The 3-D profiles of carriers are obtained across the graded AlGaN/GaN heterostructure grown on a sapphire substrate, which brings about some novel features. The dc transfer and frequency characteristics exhibit bias-insensitive throughout the low- and high-voltage operating regions, demonstrating the potential for high linearity applications. In addition, dynamic I-V measurement was carried out to analyze the trapping behaviors. Negligible current collapses were observed in the unpassivated PolFETs with graded heterostructure, which can be explained in the aspect of unique energy band profiles of AlGaN/GaN graded heterostructures.
Keywords :
III-V semiconductors; aluminium compounds; band structure; field effect transistors; gallium compounds; sapphire; semiconductor device manufacture; semiconductor doping; wide band gap semiconductors; AlGaN-GaN; DC transfer; PolFET; bias-insensitive; carrier 3D profiles; energy band profiles; frequency characteristics; high linearity applications; polarization-doped field-effect transistors; sapphire substrate; Aluminum gallium nitride; Current measurement; Gallium nitride; HEMTs; Logic gates; MODFETs; Polarization; 3-D electron slab; current collapse; field-effect transistors (FETs); graded heterostructure; linearity; linearity.;
Journal_Title :
Electron Devices, IEEE Transactions on
DOI :
10.1109/TED.2014.2364457