DocumentCode
24342
Title
AlGaN/GaN Polarization-Doped Field-Effect Transistors With Graded Heterostructure
Author
Yulong Fang ; Zhihong Feng ; Jiayun Yin ; Xingye Zhou ; Yuangang Wang ; Guodong Gu ; Xubo Song ; Yuanjie Lv ; Chengming Li ; Shujun Cai
Author_Institution
Sch. of Mater. Sci. & Eng., Univ. of Sci. & Technol. Beijing, Beijing, China
Volume
61
Issue
12
fYear
2014
fDate
Dec. 2014
Firstpage
4084
Lastpage
4089
Abstract
The design, fabrication, and characterization of AlGaN/GaN polarization-doped field-effect transistors (PolFETs) with graded heterostructure are presented in this paper. The 3-D profiles of carriers are obtained across the graded AlGaN/GaN heterostructure grown on a sapphire substrate, which brings about some novel features. The dc transfer and frequency characteristics exhibit bias-insensitive throughout the low- and high-voltage operating regions, demonstrating the potential for high linearity applications. In addition, dynamic I-V measurement was carried out to analyze the trapping behaviors. Negligible current collapses were observed in the unpassivated PolFETs with graded heterostructure, which can be explained in the aspect of unique energy band profiles of AlGaN/GaN graded heterostructures.
Keywords
III-V semiconductors; aluminium compounds; band structure; field effect transistors; gallium compounds; sapphire; semiconductor device manufacture; semiconductor doping; wide band gap semiconductors; AlGaN-GaN; DC transfer; PolFET; bias-insensitive; carrier 3D profiles; energy band profiles; frequency characteristics; high linearity applications; polarization-doped field-effect transistors; sapphire substrate; Aluminum gallium nitride; Current measurement; Gallium nitride; HEMTs; Logic gates; MODFETs; Polarization; 3-D electron slab; current collapse; field-effect transistors (FETs); graded heterostructure; linearity; linearity.;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/TED.2014.2364457
Filename
6945318
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