DocumentCode :
2434240
Title :
The current distribution and heat localization in the integrated circuits plating at the effect of electromagnetic fields
Author :
Taran, Ye.P. ; Starostenko, V.V. ; Grygoriev, Ye.V. ; Lashennikov, D.E.
Author_Institution :
Tavrical Nat. Univ., Ukraine
fYear :
2000
fDate :
11-15 Sept. 2000
Firstpage :
478
Lastpage :
479
Abstract :
The numerical researches on investigation of current distribution nature in plating are conducted at the effect of electromagnetic fields. The mechanisms leading to microscopic degradation of plating and edge effects origin are detected.
Keywords :
current distribution; electromagnetic fields; integrated circuit modelling; current distribution; edge effect; electromagnetic field; heat localization; integrated circuit plating; Current density; Current distribution; Degradation; Electromagnetic fields; Electromagnetic heating; IEEE catalog; Metallization; Microwave technology; Organizing; Threshold voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microwave Conference, 2000. Microwave and Telecommunication Technology. 2000 10th International Crimean
Conference_Location :
Crimea, Ukraine
Print_ISBN :
966-572-048-1
Type :
conf
DOI :
10.1109/CRMICO.2000.1256190
Filename :
1256190
Link To Document :
بازگشت