Title :
A-Si:H solar cells using the hot-wire technique-how to exceed efficiencies of 10%
Author :
Bauer, S. ; Herbst, W. ; Schroder, B. ; Oechsner, H.
Author_Institution :
Dept. of Phys., Kaiserslautern Univ., Germany
fDate :
29 Sep-3 Oct 1997
Abstract :
In this study we describe our latest efforts to improve the efficiency and stability of hot-wire (HW-) a-Si:H based solar cells by further optimizing p/i-interface and i-layer quality. In-situ ellipsometry has been used to determine the film microstructure (density, roughness) at the crucial p/i-interface and of the fully grown i-layers. A detailed investigation of the effect of varying the process gas pressure, p and filament temperature, Tfil enabled us to improve the interface and bulk i-layer quality significantly. The microstructure, especially at the p/i-interface but also of the i-layer, has been found to sensitively correlate with the cell performance. The resulting solar cells exhibited efficiencies as high as 9.7% although there are two “air breaks”, sputtered n-layers and simple evaporated aluminum rear contacts. Moreover, for the first time we report on results concerning the effect of hydrogen dilution on the stability of HW-a-Si:H i-layers and solar cells
Keywords :
amorphous semiconductors; elemental semiconductors; ellipsometry; hydrogen; plasma CVD; plasma CVD coatings; semiconductor growth; semiconductor thin films; silicon; solar cells; surface topography; Si:H; a-Si:H based solar cells; bulk i-layer quality; density; efficiency improvement; evaporated aluminum rear contacts; filament temperature; film microstructure; hot-wire technique; hydrogen dilution effects; i-layer quality optimisation; in-situ ellipsometry; microstructure; p/i-interface optimisation; process gas pressure variation; sputtered n-layers; stability improvement; surface roughness; Aluminum; Ellipsometry; Hydrogen; Microstructure; Optical films; Photovoltaic cells; Plasma temperature; Silicon; Stability; Substrates;
Conference_Titel :
Photovoltaic Specialists Conference, 1997., Conference Record of the Twenty-Sixth IEEE
Conference_Location :
Anaheim, CA
Print_ISBN :
0-7803-3767-0
DOI :
10.1109/PVSC.1997.654190