• DocumentCode
    2434493
  • Title

    High current electron source for linear inductive injector

  • Author

    Kornuhin, A.A. ; Krylov, A.V. ; Maslennikov, O.Yu. ; Potapov, Yu.A. ; Smimov, V.A. ; Sudakov, Yu.S. ; Kuznetsov, G.I. ; Logatchev, P.V.

  • Author_Institution
    FSUE "SPE Toriy", Moscow
  • fYear
    2008
  • fDate
    15-19 June 2008
  • Firstpage
    1
  • Lastpage
    1
  • Abstract
    The structure of a sizable cathode unit with 180 mm outer diameter and 190 mm radius of the emitter\´s spherical concave surface for a linear inductive injector accelerator has been developed. The cathode unit provides long-term work with an emission current of not less than 2500 A in microsecond pulse mode. The cathode unit is sketched. The emitter is a dispenser. Its tungsten porous matrix is built on a molybdenum base with the aid of the plasma deposition method. The matrix is impregnated by emission material. Final processing of the emitter is ion bombardment etching and vacuum osmium deposition. The cathode heater is performed as two parallel spirals with variable winding density which depends on the radial coordinate of the emitter. This solution provides homogeneous heating of the emission surface. The cathode heat saving is achieved by means of a system of holders (similar to a "squirrel circle") and reflectors. The heater power does not exceed 3 kW at the required cathode temperature range of 1000-1100degC.
  • Keywords
    cathodes; electron sources; linear accelerators; molybdenum; osmium; tungsten; Mo; Os; W; bombardment etching; cathode heater; cathode unit; emission material; heater power; high current electron source; linear inductive injector accelerator; microsecond pulse mode; molybdenum base; plasma deposition; radius 190 mm; spherical concave surface; tungsten porous matrix; vacuum osmium deposition; winding density; Cathodes; Electron sources; Etching; Linear accelerators; Plasma accelerators; Plasma applications; Plasma density; Plasma materials processing; Spirals; Tungsten;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 2008. ICOPS 2008. IEEE 35th International Conference on
  • Conference_Location
    Karlsruhe
  • ISSN
    0730-9244
  • Print_ISBN
    978-1-4244-1929-6
  • Electronic_ISBN
    0730-9244
  • Type

    conf

  • DOI
    10.1109/PLASMA.2008.4590626
  • Filename
    4590626