DocumentCode :
2434619
Title :
Effect of Surface Roughness on Magnetization Reversal of Co Films on Plasma-Etched Si
Author :
Li, Meng ; Zhao, Y.P. ; Wang, G.C. ; Min, H.G.
Author_Institution :
Hong-Ik Univ., Korea
fYear :
1998
fDate :
6-9 Jan. 1998
Firstpage :
27
Lastpage :
27
Keywords :
Chemicals; Magnetic anisotropy; Magnetic films; Magnetic resonance; Magnetization reversal; Magnetosphere; Perpendicular magnetic anisotropy; Plasmas; Rough surfaces; Surface roughness;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
MMM-Intermag Conference, 1998. Abstracts., The 7th Joint
Conference_Location :
San Francisco, CA, USA
Print_ISBN :
0-7803-5118-5
Type :
conf
DOI :
10.1109/INTMAG.1998.735516
Filename :
735516
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=2434619
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