DocumentCode :
2434791
Title :
High performance MEMS spiral inductors
Author :
Fang, Dong-Ming ; Yuan, Quan ; Li, Xiu-Han ; Zhang, Hai-Xia ; Zhou, Yong ; Zhao, Xiao-Lin
Author_Institution :
Inst. of Microelectron., Peking Univ., Beijing, China
fYear :
2010
fDate :
20-23 Jan. 2010
Firstpage :
1033
Lastpage :
1035
Abstract :
In this paper, fabrication and performance of RF MEMS planar spiral inductors is presented. The fabrication process is simple, using surface micromachined technology with three masks. Two types of spiral inductor were fabricated and the measured results showed that the spiral inductors had high performance at high frequency. The maximum quality of the spiral inductor-Type A is 15.8 at 1.4 GHz with inductance of 4.61 nH. The maximum quality of the spiral inductor-Type B is 19.7 at 4.1 GHz with inductance of 1.40 nH.
Keywords :
inductors; micromachining; micromechanical devices; RF MEMS planar spiral inductors; frequency 1.4 GHz; frequency 4.1 GHz; spiral inductor-Type A; spiral inductor-Type B; surface micromachined technology;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Nano/Micro Engineered and Molecular Systems (NEMS), 2010 5th IEEE International Conference on
Conference_Location :
Xiamen
Print_ISBN :
978-1-4244-6543-9
Type :
conf
DOI :
10.1109/NEMS.2010.5592582
Filename :
5592582
Link To Document :
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