• DocumentCode
    2435449
  • Title

    Application of a MASWP: Duo_Plasmaline next generation

  • Author

    Alberts, Lukas ; Kaiser, Mathias ; Hunyar, Christian ; Graf, Matthias ; Nauenburg, Klaus ; Räuchle, Eberhard

  • Author_Institution
    Fraunhofer ICT, Pfinztal
  • fYear
    2008
  • fDate
    15-19 June 2008
  • Firstpage
    1
  • Lastpage
    1
  • Abstract
    Summary form only given. Microwave based surface wave plasma reactors like those relying on the Duo-Plasmaline encounters large success in dielectric coating applications. But they show principal limitation to dielectric materials applications. We attempt here to present a Duo-Plasmaline NG based on the metal antenna SWP. This design would circumvent the dielectric coating limitation. The propagation length of the plasma will be reported as a function of gas pressure, microwave power and bias potential for different atmospheres like argon, nitrogen and oxygen. The plasma homogeneity will be reflected in the coating thickness evolution of a PECVD thin film along the antenna.
  • Keywords
    argon; nitrogen; oxygen; plasma CVD; plasma CVD coatings; plasma sources; Ar; Duo-Plasmaline; N2; O2; PECVD thin film; bias potential; dielectric coating; gas pressure; metal antenna; microwave power; plasma homogeneity; plasma propagation length; surface wave plasma reactors; Antennas and propagation; Coatings; Dielectric materials; Dielectric thin films; Inductors; Microwave propagation; Plasma applications; Plasma materials processing; Plasma waves; Surface waves;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 2008. ICOPS 2008. IEEE 35th International Conference on
  • Conference_Location
    Karlsruhe
  • ISSN
    0730-9244
  • Print_ISBN
    978-1-4244-1929-6
  • Electronic_ISBN
    0730-9244
  • Type

    conf

  • DOI
    10.1109/PLASMA.2008.4590673
  • Filename
    4590673