DocumentCode
2435535
Title
Deposition of ZNO films on inner walls of plastic tubes by DC arc plasmatron
Author
Penkov, Oleksiy V. ; Plaksin, Vadim Yu ; Lee, Heon-Ju ; Mansur, Rakib
Author_Institution
Cheju Nat. Univ., Cheju
fYear
2008
fDate
15-19 June 2008
Firstpage
1
Lastpage
1
Abstract
Summary form only given. New model of a DC arc plasmatron was developed. It was used for deposition of thin ZnO and Al2O3 films on the inner walls of acryl tubes. Deposition was done on the air. Tubes with inner diameter of 60 mm were used. The special construction of the plasmatron allows depositing films on plastic substrate because of low heating. Substrate temperature didn´t exceed 40degC during the deposition process. Zinc acetylacetonate and aluminum acetylacetonate were used as a source material and oxygen as a working gas and argon as cathode protect gas. The plasmatron powered was varied in the range of 700-1500 watts to optimization of the deposition parameters and properties of the growth films. Deposition rate about 100 nm/min was achieved. The crystal structure and surface composition of the films were analyzed by X-Ray diffractometry and X-ray photoelectron spectroscopy. Four probe technique was used for the resistivity measurement. The transmittance of films was measured using spectrophotometry.
Keywords
II-VI semiconductors; X-ray diffraction; X-ray photoelectron spectra; aluminium compounds; arcs (electric); crystal structure; electrical resistivity; plasma deposition; plasma diodes; semiconductor growth; semiconductor thin films; surface composition; wide band gap semiconductors; zinc compounds; Al2O3; DC arc plasmatron; X-ray diffractometry; X-ray photoelectron spectroscopy; ZnO; acryl tubes; crystal structure; inner walls; low heating; plastic tubes; power 700 W to 1500 W; resistivity; size 60 mm; spectrophotometry; surface composition; thin films; transmittance; Aluminum; Argon; Crystalline materials; Heating; Plasma materials processing; Plasma properties; Plasma sources; Plasma temperature; Plastic films; Zinc oxide;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science, 2008. ICOPS 2008. IEEE 35th International Conference on
Conference_Location
Karlsruhe
ISSN
0730-9244
Print_ISBN
978-1-4244-1929-6
Electronic_ISBN
0730-9244
Type
conf
DOI
10.1109/PLASMA.2008.4590679
Filename
4590679
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