DocumentCode
2435698
Title
High current multicapillary dielectric cathode
Author
Gleizer, J.Z. ; Hadas, Y. ; Gurovitch, V.Ts. ; Felstainer, J. ; Krasik, Ya E.
Author_Institution
Phys. Dept., Technion - Israel Inst. of Technol., Haifa
fYear
2008
fDate
15-19 June 2008
Firstpage
1
Lastpage
1
Abstract
Results of high-current electron beam generation in a ~200 kV, ~250 ns diode with a multicapillary dielectric cathode assisted by either velvet-type or ferroelectric plasma sources are presented. Multicapillary cathodes made of cordierite, glass, and quartz glass samples were studied. It was found that the source of electrons is the plasma ejected from capillaries. The plasma parameters inside capillary channels and in the vicinity of the cathode surface were determined during the accelerating pulse. A model of the plasma supersonic flow from dielectric capillaries is discussed. It was shown that glass multicapillary cathodes are characterized by producing less surface erosion than the cordierite cathodes. Also, it was found that multicapillary cathodes assisted by a ferroelectric plasma source showed longer lifetime and better vacuum compatibility than multicapillary cathodes assisted by a velvet-type igniter. Finally, it was found that quartz glass MCDC assisted by FPS is characterized by almost simultaneous formation of the plasma in a cross-sectional area of the dielectric sample with respect to the beginning of the accelerating pulse.
Keywords
cathodes; dielectric materials; electron beams; glass; plasma applications; plasma flow; plasma sources; quartz; FPS; capillary channels; cordierite multicapillary cathodes; dielectric capillaries; ferroelectric plasma source; high current electron beam generation; high current multicapillary dielectric cathode; plasma supersonic flow; quartz glass MCDC; quartz glass multicapillary cathodes; surface erosion; velvet type plasma source; Acceleration; Cathodes; Dielectrics; Diodes; Electron beams; Ferroelectric materials; Glass; Physics; Plasma accelerators; Plasma sources;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science, 2008. ICOPS 2008. IEEE 35th International Conference on
Conference_Location
Karlsruhe
ISSN
0730-9244
Print_ISBN
978-1-4244-1929-6
Electronic_ISBN
0730-9244
Type
conf
DOI
10.1109/PLASMA.2008.4590686
Filename
4590686
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