DocumentCode :
2436286
Title :
Contributions to the synthesis of thin organic films via low-pressure non-equilibrium plasma deposition
Author :
Totolin, Marian I. ; Neamtu, Iordana ; Filip, Daniela ; Stoica, Iuliana ; Macocinschi, Doina
Author_Institution :
Petru Poni Inst. of Macromolecular Chem., Iasi
fYear :
2008
fDate :
15-19 June 2008
Firstpage :
1
Lastpage :
1
Abstract :
Summary form only given. Plasma polymerization offers an ecological, potentially tunable route to selectively and controllably change the physics and chemistry of the outer surface of a material. It presents an exciting chance to produce pinhole free, conformal thin films, containing high concentrations of specific functional groups at the surface, deposited on most supports, by complex reactions in the plasma environment, but makes difficult to predict and characterize their chemistries. In the investigation, an experimental study and physical-chemical analysis of the initiated plasma polymerization are described. A low pressure non-equilibrium plasma deposition process is useful for the preparation of ultra thin films from a homologous series of alkyl acrylates from methyl to butyl, deposited on planar supports of organic and inorganic nature (paper, glass). The resulting polymers harmonized well spectroscopically with those from classical polymerization, indicating that stoichiometric polymers with no evident crosslinking can be achieved in the plasma environment. The surface free energy of the films was evaluated by a CAM computer controlled video based instrument. The morphology of films was studied by atomic force microscopy, operated in the tapping mode. We consider that these coatings will exhibit protective characteristics against environmental agents (light, temperature, humidity, fungus) and they will find utility in the field of protection and consolidation of artifacts with historical and artistic significance in the restoration of Cultural Heritage.
Keywords :
atomic force microscopy; free energy; plasma deposited coatings; plasma deposition; polymer films; polymerisation; protective coatings; surface energy; alkyl acrylates; atomic force microscopy; coatings; low-pressure nonequilibrium plasma deposition; morphology; physical-chemical analysis; plasma polymerization; polymers; surface free energy; thin organic films; Atomic force microscopy; Glass; Physics; Plasma chemistry; Plasma materials processing; Plasma temperature; Polymer films; Protection; Sputtering; Surface morphology;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science, 2008. ICOPS 2008. IEEE 35th International Conference on
Conference_Location :
Karlsruhe
ISSN :
0730-9244
Print_ISBN :
978-1-4244-1929-6
Electronic_ISBN :
0730-9244
Type :
conf
DOI :
10.1109/PLASMA.2008.4590720
Filename :
4590720
Link To Document :
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