• DocumentCode
    2436286
  • Title

    Contributions to the synthesis of thin organic films via low-pressure non-equilibrium plasma deposition

  • Author

    Totolin, Marian I. ; Neamtu, Iordana ; Filip, Daniela ; Stoica, Iuliana ; Macocinschi, Doina

  • Author_Institution
    Petru Poni Inst. of Macromolecular Chem., Iasi
  • fYear
    2008
  • fDate
    15-19 June 2008
  • Firstpage
    1
  • Lastpage
    1
  • Abstract
    Summary form only given. Plasma polymerization offers an ecological, potentially tunable route to selectively and controllably change the physics and chemistry of the outer surface of a material. It presents an exciting chance to produce pinhole free, conformal thin films, containing high concentrations of specific functional groups at the surface, deposited on most supports, by complex reactions in the plasma environment, but makes difficult to predict and characterize their chemistries. In the investigation, an experimental study and physical-chemical analysis of the initiated plasma polymerization are described. A low pressure non-equilibrium plasma deposition process is useful for the preparation of ultra thin films from a homologous series of alkyl acrylates from methyl to butyl, deposited on planar supports of organic and inorganic nature (paper, glass). The resulting polymers harmonized well spectroscopically with those from classical polymerization, indicating that stoichiometric polymers with no evident crosslinking can be achieved in the plasma environment. The surface free energy of the films was evaluated by a CAM computer controlled video based instrument. The morphology of films was studied by atomic force microscopy, operated in the tapping mode. We consider that these coatings will exhibit protective characteristics against environmental agents (light, temperature, humidity, fungus) and they will find utility in the field of protection and consolidation of artifacts with historical and artistic significance in the restoration of Cultural Heritage.
  • Keywords
    atomic force microscopy; free energy; plasma deposited coatings; plasma deposition; polymer films; polymerisation; protective coatings; surface energy; alkyl acrylates; atomic force microscopy; coatings; low-pressure nonequilibrium plasma deposition; morphology; physical-chemical analysis; plasma polymerization; polymers; surface free energy; thin organic films; Atomic force microscopy; Glass; Physics; Plasma chemistry; Plasma materials processing; Plasma temperature; Polymer films; Protection; Sputtering; Surface morphology;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 2008. ICOPS 2008. IEEE 35th International Conference on
  • Conference_Location
    Karlsruhe
  • ISSN
    0730-9244
  • Print_ISBN
    978-1-4244-1929-6
  • Electronic_ISBN
    0730-9244
  • Type

    conf

  • DOI
    10.1109/PLASMA.2008.4590720
  • Filename
    4590720