DocumentCode
2436286
Title
Contributions to the synthesis of thin organic films via low-pressure non-equilibrium plasma deposition
Author
Totolin, Marian I. ; Neamtu, Iordana ; Filip, Daniela ; Stoica, Iuliana ; Macocinschi, Doina
Author_Institution
Petru Poni Inst. of Macromolecular Chem., Iasi
fYear
2008
fDate
15-19 June 2008
Firstpage
1
Lastpage
1
Abstract
Summary form only given. Plasma polymerization offers an ecological, potentially tunable route to selectively and controllably change the physics and chemistry of the outer surface of a material. It presents an exciting chance to produce pinhole free, conformal thin films, containing high concentrations of specific functional groups at the surface, deposited on most supports, by complex reactions in the plasma environment, but makes difficult to predict and characterize their chemistries. In the investigation, an experimental study and physical-chemical analysis of the initiated plasma polymerization are described. A low pressure non-equilibrium plasma deposition process is useful for the preparation of ultra thin films from a homologous series of alkyl acrylates from methyl to butyl, deposited on planar supports of organic and inorganic nature (paper, glass). The resulting polymers harmonized well spectroscopically with those from classical polymerization, indicating that stoichiometric polymers with no evident crosslinking can be achieved in the plasma environment. The surface free energy of the films was evaluated by a CAM computer controlled video based instrument. The morphology of films was studied by atomic force microscopy, operated in the tapping mode. We consider that these coatings will exhibit protective characteristics against environmental agents (light, temperature, humidity, fungus) and they will find utility in the field of protection and consolidation of artifacts with historical and artistic significance in the restoration of Cultural Heritage.
Keywords
atomic force microscopy; free energy; plasma deposited coatings; plasma deposition; polymer films; polymerisation; protective coatings; surface energy; alkyl acrylates; atomic force microscopy; coatings; low-pressure nonequilibrium plasma deposition; morphology; physical-chemical analysis; plasma polymerization; polymers; surface free energy; thin organic films; Atomic force microscopy; Glass; Physics; Plasma chemistry; Plasma materials processing; Plasma temperature; Polymer films; Protection; Sputtering; Surface morphology;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science, 2008. ICOPS 2008. IEEE 35th International Conference on
Conference_Location
Karlsruhe
ISSN
0730-9244
Print_ISBN
978-1-4244-1929-6
Electronic_ISBN
0730-9244
Type
conf
DOI
10.1109/PLASMA.2008.4590720
Filename
4590720
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