DocumentCode
2438189
Title
Behaviors of excited N, N2 + and NH in modulated induction thermal plasmas
Author
Tanaka, Y. ; Hayashi, K. ; Ito, T. ; Uesugi, Y.
Author_Institution
Div. Electr. Eng. & Comp. Sci., Kanazawa Univ., Ishikawa
fYear
2008
fDate
15-19 June 2008
Firstpage
1
Lastpage
1
Abstract
Summary form only given. High-power high-pressure induction thermal plasmas have been widely used in many material processing fields such as syntheses of nanopowders and thermal barrier coatings etc, because they have advantages such as remarkably higher enthalpy and higher radical density than cold plasmas, and also little contamination. To functionalize induction thermal plasmas, we have developed a pulse-modulated induction thermal plasma (PMITP). This PMITP offers the possibility of controlling temperature, chemical reaction and gas flow fields in thermal plasmas, and then is expected as a radical and heat source for material processing. Recently we found that one can create more nitrogen atomic density in Ar-N2 PMITP than in a non-modulated convectional thermal plasma under the same power condition. In this report, time variation in radiation spectra from Ar, N, N2 + and NH was measured to study dynamic behaviors of these particles in Ar PMITP with N2/H2 additional gases. The radiation intensities were observed using a time resolved CCD. In thermal plasma material processing, the densities of N and NH are considered to be crucial for rapid surface nitriding process of materials. From this measurement, their inherent periodical behaviors were found in the radiation intensities of these spectra following the pulse modulation of the coil current sustaining PMITP. Furthermore, we compared the time-averaged radiation intensities for N, N2 + and NH in a PMITP with those in a non-modulated conventional induction thermal plasma under the same input power condition. Results showed increases in the time- averaged radiation intensities of N and NH by the pulse- modulation of the coil current compared with that in a non- modulated thermal plasma.
Keywords
enthalpy; excited states; induction heating; materials preparation; nitrogen; nitrogen compounds; plasma materials processing; plasma temperature; positive ions; Ar; N; N2 +; NH; PMITP; chemical reaction; excited N2+; excited NH; gas flow fields; high enthalpy; high radical density; high-power high-pressure induction thermal plasmas; modulated induction thermal plasmas; nanopowders; nitrogen atomic density; pulse-modulated induction thermal plasma; radiation spectra; temperature control; thermal barrier coatings; thermal plasma material processing; time resolved CCD; Argon; Coils; Plasma chemistry; Plasma density; Plasma materials processing; Plasma measurements; Plasma sources; Plasma temperature; Pollution measurement; Pulse modulation;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science, 2008. ICOPS 2008. IEEE 35th International Conference on
Conference_Location
Karlsruhe
ISSN
0730-9244
Print_ISBN
978-1-4244-1929-6
Electronic_ISBN
0730-9244
Type
conf
DOI
10.1109/PLASMA.2008.4590828
Filename
4590828
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