Title :
New direction in nanotechnology: cluster ion beam technique
Author :
Popok, V.N. ; Prasalovich, S.V. ; Campbell, E.E.B.
Author_Institution :
Chalmers Univ. of Technol., Goteborg, Sweden
Abstract :
A brief state-of-the-art review in the field of cluster ion interaction with surface is presented. Ionised cluster beams are considered as a powerful and versatile tool for modification and processing of surfaces and near-surface layers as an alternative to ion implantation and ion assisted deposition. The main effects of cluster-surface collisions and possible applications of cluster ion beams are discussed.
Keywords :
cluster tools; etching; ion beam effects; ion-surface impact; ionised cluster beam deposition; nanotechnology; sputter deposition; cluster ion interaction; cluster-surface collision; ion assisted deposition; ionised cluster beam; Acceleration; Atomic layer deposition; Atomic measurements; Doping; Fabrication; Ion beams; Ion implantation; Nanotechnology; Smoothing methods; Sputtering;
Conference_Titel :
Microwave and Telecommunication Technology, 2003. CriMiCo 2003. 13th International Crimean Conference
Conference_Location :
Sevastopol, Crimea, Ukraine
Print_ISBN :
966-7968-26-X
DOI :
10.1109/CRMICO.2003.158920
