DocumentCode :
2438579
Title :
Fundamental electronic properties of materials for terahertz vacuum electron devices
Author :
Yang, Benjamin B. ; Willis, Keely J. ; Knezevic, Irena ; Hagness, Susan C. ; Cerrina, Franco ; Van der Weide, Daniel W. ; Booske, John H.
Author_Institution :
Dept. of Electr. & Comput. Eng., Univ. of Wisconsin-Madison, Madison, WI
fYear :
2008
fDate :
15-19 June 2008
Firstpage :
1
Lastpage :
1
Abstract :
In this paper theoretical and experimental study of the effects of surface roughness and metal film characteristics in the THz regime ohmic dissipation of the micro vacuum electron devices. A novel computer simulation tool was developed to self-consistent model and theoretical predictions were validated using a quasi-optical resonant cavity. Fabrication technique was used to create controlled, nanotextured surface and conductivity measurement of nanostructured sample was conducted using resonant cavity. The knowledge and computational tools obtained from this research will have wide-scale application in the development of high-frequency electronic devices and components. The authors will present the current research progress and results of this project.
Keywords :
cavity resonators; electrical conductivity; metallic thin films; micromechanical devices; nanostructured materials; surface roughness; computer simulation tool; electrical conductivity; electronic property; high-frequency electronic devices; metal film property; micro vacuum electron devices; nanotextured surface; ohmic dissipation; quasioptical resonant cavity; surface roughness; terahertz device process; terahertz vacuum electron devices; Circuits; Conductivity; Electron devices; Frequency; Millimeter wave measurements; Millimeter wave technology; Power engineering and energy; Resonance; Rough surfaces; Surface roughness;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science, 2008. ICOPS 2008. IEEE 35th International Conference on
Conference_Location :
Karlsruhe
ISSN :
0730-9244
Print_ISBN :
978-1-4244-1929-6
Electronic_ISBN :
0730-9244
Type :
conf
DOI :
10.1109/PLASMA.2008.4590849
Filename :
4590849
Link To Document :
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