DocumentCode
2438802
Title
Influence of Tb-dopant on water adsorption and wettability of TiO2 thin films
Author
Wojcieszak, Damian ; Domaradzki, Jaroslaw ; Kaczmarek, Danuta ; Mazur, Michal ; Lapinski, Marcin ; Zielinski, Maciej
Author_Institution
Fac. of Microsyst. Electron. & Photonics, Wroclaw Univ. of Technol., Wroclaw, Poland
fYear
2009
fDate
25-27 June 2009
Firstpage
80
Lastpage
83
Abstract
In this work wettability and adsorption of OH- groups and H2O particles on the surface of TiO2 thin films doped with different concentration of Tb have been described. Thin films were manufactured by magnetron sputtering process. The particles were sputtered from metallic Ti-Tb target under low pressure of oxygen gas. The results of structural investigation (X-ray diffraction measurements) have shown that Tb-dopant has meaningful influence on structure of prepared thin films. The role of terbium on the surface adsorption of nanocrystalline TiO2:Tb thin films was revealed from X-ray photoelectron spectroscopy measurements. The wetting angle measurements and XPS results have shown that TiO2:Tb (0.4 at. %) thin film, with anatase structure, had the highest adsorption ability and the smallest wetting angle. Moreover, the wettability of this film was almost as high as in the case of super-hydrophilic films. TiO2:Tb (2.6 at. %) thin film had rutile structure, low adsorption ability and the highest value of wetting angle as-compared to other manufactured films.
Keywords
X-ray diffraction; X-ray photoelectron spectra; adsorbed layers; adsorption; contact angle; hydrophilicity; nanostructured materials; sputtered coatings; terbium; titanium compounds; water; wetting; H2O; H2O particles; OH; OH- groups; Tb dopant concentration; TiO2:Tb; X-ray diffraction; X-ray photoelectron spectroscopy; XPS; anatase structure; hydroxide groups; low-pressure oxygen gas; magnetron sputtering; metallic Ti-Tb target; nanocrystalline thin films; rutile structure; structural properties; superhydrophilic films; surface adsorption; water particles; wettability; wetting angle measurements; Crystallization; Manufacturing processes; Mechanical factors; Optical films; Photonic crystals; Plasma measurements; Spectroscopy; Sputtering; Transistors; X-ray diffraction;
fLanguage
English
Publisher
ieee
Conference_Titel
Students and Young Scientists Workshop "Photonics and Microsystems", 2009 International
Conference_Location
Wernigerode
Print_ISBN
978-1-4244-4304-8
Type
conf
DOI
10.1109/STYSW.2009.5470297
Filename
5470297
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