Title :
Preparation of TiO2 thin films by reactive evaporation method
Author :
Grodzicki, Milosz ; Wasielewski, Radoslaw ; Mazur, Piotr ; Zuber, Stefan ; Ciszewski, Antoni
Author_Institution :
Inst. of Exp. Phys., Univ. of Wroclaw, Wroclaw, Poland
Abstract :
Thin films of TiO2 were prepared on glass substrates by reactive evaporation of TiO. Properties of the thin films were investigated under ultrahigh vacuum conditions by X-ray photoelectron spectroscopy (XPS) and atomic force microscopy (AFM). AFM topography exhibits a uniformity structure of the thin films and shows a high quality nanocrystalline structure of TiO2 with grain size ranging from 28 nm to 35nm. The XPS Ti-2p spectra confirmed the occurrence of the 4+oxidation state of Ti and the O-1s spectra revealed the presence of an O-2 photoelectron peak. The calculated O/Ti ratio in TiO2 thin films was in the range 1.85-2.15 depending on the samples. Additional analysis of the thin films was carried out by X-ray powder diffraction (XRD).
Keywords :
X-ray diffraction; X-ray photoelectron spectra; atomic force microscopy; evaporation; glass; grain size; nanostructured materials; oxidation; substrates; thin films; titanium compounds; TiO2; X-ray photoelectron spectroscopy; X-ray powder diffraction; XPS Ti-2p spectra; atomic force microscopy; glass substrates; grain size; nanocrystalline structure; oxidation state; reactive evaporation method; thin films; ultrahigh vacuum conditions; Atomic force microscopy; Glass; Grain size; Nanostructures; Oxidation; Photoelectron microscopy; Powders; Spectroscopy; Surfaces; Transistors;
Conference_Titel :
Students and Young Scientists Workshop "Photonics and Microsystems", 2009 International
Conference_Location :
Wernigerode
Print_ISBN :
978-1-4244-4304-8
DOI :
10.1109/STYSW.2009.5470308
