Plasma source and ADVAM-technology of thin film deposition based on discharge in anode material vapors

Results are presented of investigating the solid state materials plasma flow source based on arc discharge in the vapors of anode material. The source may be efficient in hard vacuum or for a vacuum chamber with gas let in. It is shown that this source allows for droplet-free and highly ionized plasma flows of various metals with a compensated volumetric charge. Practical applications for this source are listed. Its implementation in the deposition of optical films with the reflection factor K=99.2% at the 1.315/spl mu/m wavelength and the deposition of resistive layers is described. This source may be specifically used in the manufacture of microwaves devices, telecommunications systems elements and ICs.