Title :
2000 5th International Symposium on Plasma Process-Induced Damage (IEEE Cat. No.00TH8479)
Abstract :
The following topics were dealt with: charging damage; gate oxides; SOI technology; CVD processing; electron shading; front-end processing; multilevel interconnects; 300 mm technology; copper and low-κ dielectrics; dielectric thin films; antenna test structures; interlevel dielectrics.
Keywords :
plasma materials processing; semiconductor technology; antenna test structures; electron shading; plasma process-induced damage; semiconductor manufacturing; surface charging;
Conference_Titel :
Plasma Process-Induced Damage, 2000 5th International Symposium on
Conference_Location :
Santa Clara, CA, USA
Print_ISBN :
0-9651577-4-1
DOI :
10.1109/PPID.2000.870552
