• DocumentCode
    2441434
  • Title

    ESD and latch-up characteristics of semiconductor device with thin epitaxial substrate

  • Author

    Suzuki, Teruo ; Sekino, Satoshi ; Ito, Seigo ; Monma, Hideo

  • Author_Institution
    Dept. of Syst. LSI Design, Fujitsu VLSI Ltd., Mie, Japan
  • fYear
    1998
  • fDate
    6-8 Oct. 1998
  • Firstpage
    199
  • Lastpage
    207
  • Abstract
    We have evaluated latch-up and ESD characteristics using substrates which have a relatively thin epi layer of 1 /spl mu/m to 5 /spl mu/m. From the measurement results, we found that latch-up immunity does not necessarily increase as the epi layer becomes thinner. The ESD immunities of both the machine model (MM) and the human body model (HBM) have the same tendency that depends on the epi layer thickness and are weakest when the epi layer thickness is 2 /spl mu/m. By examining the latch-up and ESD immunity measurement results, we found that low resistivity substrates greatly affected these results.
  • Keywords
    CMOS integrated circuits; electrical resistivity; electrostatic discharge; integrated circuit measurement; integrated circuit reliability; semiconductor epitaxial layers; 1 to 5 micron; 2 micron; CMOS devices; ESD; ESD characteristics; ESD immunity; ESD immunity measurement; Si; epilayer thickness; human body model; latch-up characteristics; latch-up immunity; latch-up immunity measurement; machine model; semiconductor device; substrate resistivity; thin epi layer; thin epitaxial substrate; Circuit noise; Circuit testing; Conductivity; Electrostatic discharge; Immune system; Inverters; Large scale integration; Semiconductor devices; Silicon; Substrates;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electrical Overstress/Electrostatic Discharge Symposium Proceedings, 1998
  • Conference_Location
    Reno, NV, USA
  • Print_ISBN
    1-878303-91-0
  • Type

    conf

  • DOI
    10.1109/EOSESD.1998.737039
  • Filename
    737039