DocumentCode :
2442140
Title :
High-Frequency and Low-Dispersion SAW Devices on AlN/Al2O3and AlN/Si for Signal Processing
Author :
Tsubouchi, K. ; Sugai, K. ; Mikoshiba, N.
fYear :
1980
fDate :
1980
Firstpage :
446
Lastpage :
450
Keywords :
Chemical vapor deposition; Degradation; Grain size; Piezoelectric films; Semiconductor films; Signal processing; Silicon; Substrates; Surface acoustic wave devices; Wideband;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
1980 Ultrasonics Symposium
Type :
conf
DOI :
10.1109/ULTSYM.1980.197437
Filename :
1534377
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=2442140
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