Source of multicharged ions and extreme ultraviolet radiation based on plasma sustained by gyrotron radiation

Summary form only given as follows. Nonequilibrium dense ECR plasma sustained by a millimeter wave radiation of gyrotrons has much benefit for modern and future applications. High power and short wavelength of heating radiation make it possible to produce plasma with unique parameters. Key features of such plasma are its nonequilibrium condition (electron temperature is much greater than ion temperature) and high plasma density providing intense flux of particles escaping from the trap. Sources of multicharged ions based on such kind of plasma are outstanding, because they are capable to produce high-current ion beams with adequate average ion charge. Results on production of multicharged ions of gases and metals are discussed in the article. For instance, nitrogen ion beam with average charge +3 was demonstrated. The use of multiaperture extraction system allowed to gain 50 mA ion beam. Results of developing of a source of extreme ultraviolet (EUV) source for lithography are also presented. The source is based on tin fiber shape plasma confined in a magnetic trap. Tin plasma was injected into mirror magnetic trap by a vacuum arc plasma gun. Multicharged metal ions are well produced in this case if millimeter wave radiation is used for plasma heating. Excitation of multicharged ions by electrons leads to line EUV radiation formation. First experiment showed EUV radiation power of 50 W in the 13.5 nm plusmn 1% range. Estimated conversion efficiency of absorbed microwave power to EUV radiation was at the level of 1%.