Title :
Low voltage, high-Q SOI MEMS varactors for RF applications
Author :
Yalçinkaya, Arda D. ; Jensen, Søen ; Hansen, Ole
Author_Institution :
Mikroelektron. Centret, Tech. Univ. of Denmark, Lyngby, Denmark
Abstract :
A micro electromechanical tunable capacitor with a low control voltage, a wide tuning range and high electrical quality factor is presented with detailed characterizations. A 50/spl mu/m thick single-crystalline silicon layer was etched using deep reactive ion etching (DRIE) for obtaining high-aspect ratio (>20) parallel comb-drive structures with vertical sidewalls. Consisting of only one lithographic mask step, the process sequence can be completed in a short time. Having 1 pF of nominal capacitance, the device offers an electrical quality factor of 100 at 100MHz and a self resonance at 4.08 GHz, enabling the usage as a passive component in the RF band. The mechanical settling time of the varactor is measured to be 200 /spl mu/s in ambient air. For control voltages ranging from 1.5V to 5V, tuning ratios of 2:1, 1.7:1 and 1.5:1 are obtained from different capacitor designs. It was found that the device is a suitable passive component to be used in band-pass filtering, voltage controlled oscillator or impedance matching applications on the very high frequency(VHF) and ultra high frequency (UHF) bands.
Keywords :
band-pass filters; capacitance; impedance matching; micromechanical devices; silicon-on-insulator; sputter etching; varactors; voltage-controlled oscillators; 1.5 to 5 V; 100 MHz; 4.08 GHz; 50 micron; RF applications; SOI MEMS varactors; UHF band; VHF band; band-pass filtering; deep reactive ion etching; high electrical quality factor; impedance matching applications; lithographic mask step; low control voltage; micro electromechanical tunable capacitor; nominal capacitance; parallel comb-drive structures; process sequence; thick single-crystalline silicon layer; voltage controlled oscillator; wide tuning range; Capacitors; Etching; Low voltage; Micromechanical devices; Q factor; Radio frequency; Silicon; Tuning; Varactors; Voltage control;
Conference_Titel :
Solid-State Circuits Conference, 2003. ESSCIRC '03. Proceedings of the 29th European
Conference_Location :
Estoril, Portugal
Print_ISBN :
0-7803-7995-0
DOI :
10.1109/ESSCIRC.2003.1257208