DocumentCode :
2449352
Title :
Comparison of distance mismatch and pair matching of CMOS devices
Author :
Schaper, U. ; Linnenbank, C.
Author_Institution :
Dept. Corpotrate Logic, Infeneon Technol. AG, Munich, Germany
fYear :
2003
fDate :
16-18 Sept. 2003
Firstpage :
703
Lastpage :
705
Abstract :
Distance matching and pair matching are compared for resistors and transistors of the 130nm technology. The device mismatch depending on the spatial distance between the devices is described using a statistical gradient parameter. This gradient parameter has to be taken into account for mixed signal circuit performance if short channel transistors or small width resistors are used. The gradient parameter is an increasing function of the critical device geometry parameter like the channel length.
Keywords :
CMOS integrated circuits; integrated circuit layout; integrated circuit testing; mixed analogue-digital integrated circuits; nanotechnology; 130 nm; CMOS devices; channel length; device geometry parameter; distance mismatch; mixed signal circuit performance; pair matching; short channel transistors; small width resistors; spatial distance; statistical gradient parameter; Circuit testing; Current measurement; Electrical resistance measurement; Force measurement; Geometry; Resistors; Scattering; Semiconductor device measurement; Statistical analysis; Voltage measurement;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State Circuits Conference, 2003. ESSCIRC '03. Proceedings of the 29th European
Conference_Location :
Estoril, Portugal
Print_ISBN :
0-7803-7995-0
Type :
conf
DOI :
10.1109/ESSCIRC.2003.1257232
Filename :
1257232
Link To Document :
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