DocumentCode
2450752
Title
Efficient Monte Carlo device simulation with automatic error control
Author
Bufler, F.M. ; Schenk, A. ; Fichtner, W.
Author_Institution
Inst. fur Integrierte Syst., Eidgenossische Tech. Hochschule, Zurich, Switzerland
fYear
2000
fDate
2000
Firstpage
27
Lastpage
30
Abstract
A single-particle approach to Monte Carlo device simulation is presented where the simulation is stopped when the error for the drain, substrate or gate current is below a predefined error bar. This is achieved by alternating an ensemble simulation in the contact elements, used for the injection of a carrier, with a single-particle simulation in the active device area, thus enabling stochastically independent current estimates. Together with efficient Monte Carlo techniques, leading to CPU times of typically one hour per bias point, this makes full-band Monte Carlo “affordable” for the simulation of submicron MOSFETs
Keywords
MOSFET; Monte Carlo methods; electric current; error analysis; error correction; semiconductor device models; CPU times; MOSFETs; Monte Carlo device simulation; active device area; automatic error control; carrier injection; contact elements; drain current error; efficient Monte Carlo techniques; ensemble simulation; full-band Monte Carlo simulation; gate current error; predefined error bar; single-particle approach; single-particle simulation; stochastically independent current estimates; substrate current error; Automatic control; Boundary conditions; Computational modeling; Electrons; Error correction; Impurities; MOSFETs; Monte Carlo methods; Scattering; Substrates;
fLanguage
English
Publisher
ieee
Conference_Titel
Simulation of Semiconductor Processes and Devices, 2000. SISPAD 2000. 2000 International Conference on
Conference_Location
Seattle, WA
Print_ISBN
0-7803-6279-9
Type
conf
DOI
10.1109/SISPAD.2000.871198
Filename
871198
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