DocumentCode :
2450831
Title :
Spatial analysis of the electron transit time in a silicon/germanium heterojunction bipolar transistor by drift-diffusion, hydrodynamic, and full-band Monte Carlo device simulation
Author :
Jungemann, C. ; Neinhüs, B. ; Meinerzhagen, B.
Author_Institution :
Inst. fur Theor. Elektrotech. und Mikroelektron., Bremen Univ., Germany
fYear :
2000
fDate :
2000
Firstpage :
42
Lastpage :
45
Abstract :
Transit times and cut-off frequency of a silicon/germanium heterojunction bipolar transistor (SiGe HBT) are investigated by consistent drift-diffusion (DD), hydrodynamic (HD), and full-band Monte Carlo (FB-MC) simulations. Good agreement of all three transport models is found for the collector transit time. The quasiballistic transport in the base is well described by the HD model and yields the same transit time as the FB-MC model, whereas the DD model yields a much larger transit time, because it does not include any velocity overshoot effects. Surprisingly, in the emitter region, the FB-MC model yields the largest transit time, leading to a peak cut-off frequency for the special device structure under investigation which is even smaller than the DD peak value. The strong anisotropy of the strained band structure in the base, which is not captured in full detail by the DD and HD models, is identified as a possible reason for this unexpected behavior
Keywords :
Ge-Si alloys; Monte Carlo methods; electron mobility; heterojunction bipolar transistors; semiconductor device models; semiconductor materials; DD model; FB-MC model; HD model; SiGe; SiGe HBT; collector transit time; cut-off frequency; device structure; drift-diffusion device simulation; electron transit time; emitter region; full-band Monte Carlo device simulation; hydrodynamic device simulation; peak cut-off frequency; quasiballistic base transport; silicon/germanium heterojunction bipolar transistor; spatial analysis; strained band structure anisotropy; transit time; transit times; transport models; velocity overshoot effects; Anisotropic magnetoresistance; Cutoff frequency; Electrons; Germanium silicon alloys; Heterojunction bipolar transistors; High definition video; Hydrodynamics; Monte Carlo methods; Silicon germanium; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Simulation of Semiconductor Processes and Devices, 2000. SISPAD 2000. 2000 International Conference on
Conference_Location :
Seattle, WA
Print_ISBN :
0-7803-6279-9
Type :
conf
DOI :
10.1109/SISPAD.2000.871202
Filename :
871202
Link To Document :
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