• DocumentCode
    2450831
  • Title

    Spatial analysis of the electron transit time in a silicon/germanium heterojunction bipolar transistor by drift-diffusion, hydrodynamic, and full-band Monte Carlo device simulation

  • Author

    Jungemann, C. ; Neinhüs, B. ; Meinerzhagen, B.

  • Author_Institution
    Inst. fur Theor. Elektrotech. und Mikroelektron., Bremen Univ., Germany
  • fYear
    2000
  • fDate
    2000
  • Firstpage
    42
  • Lastpage
    45
  • Abstract
    Transit times and cut-off frequency of a silicon/germanium heterojunction bipolar transistor (SiGe HBT) are investigated by consistent drift-diffusion (DD), hydrodynamic (HD), and full-band Monte Carlo (FB-MC) simulations. Good agreement of all three transport models is found for the collector transit time. The quasiballistic transport in the base is well described by the HD model and yields the same transit time as the FB-MC model, whereas the DD model yields a much larger transit time, because it does not include any velocity overshoot effects. Surprisingly, in the emitter region, the FB-MC model yields the largest transit time, leading to a peak cut-off frequency for the special device structure under investigation which is even smaller than the DD peak value. The strong anisotropy of the strained band structure in the base, which is not captured in full detail by the DD and HD models, is identified as a possible reason for this unexpected behavior
  • Keywords
    Ge-Si alloys; Monte Carlo methods; electron mobility; heterojunction bipolar transistors; semiconductor device models; semiconductor materials; DD model; FB-MC model; HD model; SiGe; SiGe HBT; collector transit time; cut-off frequency; device structure; drift-diffusion device simulation; electron transit time; emitter region; full-band Monte Carlo device simulation; hydrodynamic device simulation; peak cut-off frequency; quasiballistic base transport; silicon/germanium heterojunction bipolar transistor; spatial analysis; strained band structure anisotropy; transit time; transit times; transport models; velocity overshoot effects; Anisotropic magnetoresistance; Cutoff frequency; Electrons; Germanium silicon alloys; Heterojunction bipolar transistors; High definition video; Hydrodynamics; Monte Carlo methods; Silicon germanium; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Simulation of Semiconductor Processes and Devices, 2000. SISPAD 2000. 2000 International Conference on
  • Conference_Location
    Seattle, WA
  • Print_ISBN
    0-7803-6279-9
  • Type

    conf

  • DOI
    10.1109/SISPAD.2000.871202
  • Filename
    871202