• DocumentCode
    2450860
  • Title

    Direct solution of the Boltzmann transport equation in nanoscale Si devices

  • Author

    Banoo, Kausar ; Lundstrom, Mark ; Smith, R.

  • Author_Institution
    Sch. of Electr. Eng., Purdue Univ., West Lafayette, IN, USA
  • fYear
    2000
  • fDate
    2000
  • Firstpage
    50
  • Lastpage
    53
  • Abstract
    We report the first direct numerical solution to the Boltzmann transport equation (BTE) without making any approximations about the angular shape of the distribution function or the collision integral. The mathematical and numerical techniques used for solving this problem are discussed and shown to have the correct properties for semiconductor simulation. The applications of this method are general and are demonstrated here, for both one-dimensional (50 nm n+-p-n+) and two-dimensional (50 nm ultra-thin body dual-gate nMOSFET) devices
  • Keywords
    Boltzmann equation; MOSFET; bipolar transistors; elemental semiconductors; mathematical analysis; nanotechnology; numerical analysis; semiconductor device models; silicon; 1D n+-p-n+ devices; 2D ultra-thin body dual-gate nMOSFETs; 50 nm; Boltzmann transport equation; Si; collision integral; distribution function; mathematical techniques; nanoscale Si devices; numerical techniques; semiconductor simulation; Acceleration; Acoustic scattering; Boltzmann equation; Distribution functions; Integral equations; MOSFET circuits; Nanoscale devices; Optical scattering; Shape; Steady-state;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Simulation of Semiconductor Processes and Devices, 2000. SISPAD 2000. 2000 International Conference on
  • Conference_Location
    Seattle, WA
  • Print_ISBN
    0-7803-6279-9
  • Type

    conf

  • DOI
    10.1109/SISPAD.2000.871204
  • Filename
    871204