Title :
How long can we succeed using the OBIRCH and its derivatives?
Author_Institution :
NEC Electron. Corp., Natick, MA, USA
Abstract :
The OBIRCH (optical beam induced resistance change) method is an indispensable failure analysis tool in the semiconductor industry. The principle of the OBIRCH is very simple, heating and detecting resistance-change, but it has many features. The derivatives of the OBIRCH are also shown to be very useful in the failure analysis of ICs. The link of ATE (automated test equipment) or LSI tester with the IR-OBIRCH system made it possible to analyze abnormal IDDQ ICs. The sensitivity of defect detection using the OBIRCH has been improved in various ways.
Keywords :
automatic test equipment; failure analysis; integrated circuit reliability; laser beam effects; ATE; IC failure analysis; IDDQ IC; IR-OBIRCH; automated test equipment; failure analysis tool; infrared optical beam induced resistance change; resistance change detection; semiconductor industry; Artificial intelligence; Failure analysis; Laser beams; Laser noise; Optical attenuators; Optical beams; Optical sensors; Spatial resolution; Testing; USA Councils;
Conference_Titel :
Test Conference, 2004. Proceedings. ITC 2004. International
Print_ISBN :
0-7803-8580-2
DOI :
10.1109/TEST.2004.1387451
